A Study of the Characteristics of Nickel Oxide Thin Films for Use in Scattering-type Super-resolution Near-Field Structure Disc
碩士 === 國立中興大學 === 材料工程學研究所 === 93 === Abstract The non-stoichiometric NiOx would be expected to decompose into Ni and O2 under pulsed laser irradiation once the temperature at NiOx films is higher than its thermal decomposition temperature. Thus, it NiOx film could be adopted as a mask layer for use...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/41968430001124581572 |