| Summary: | 碩士 === 明道大學 === 材料暨系統工程研究所 === 94 === Research on photocatalytic TiO2 film has been a focus due to its widely applications within the industry. At present, there are mainly two methods: UBM and Sol-gel. The manufacture of the film was limited by the parameters although the two methods has been industrialization. The problem is similar to the D.C. Sputtering Method which is used to deposit the photocatalytic TiO2 film. The film was directly deposited by adjusting the proportion of the Ar and O2. But the prepared samples must be post-deposition annealing at temperatures between 400~450℃ to produce the steady microstructure of the anatase phase. The film has good photocatalystic characteristics if produced by the Sol-gel method. But its mechanical characteristics cannot fit the need when it is applied to big area glass substrate.
In following study, we fabricated TiO2 films by unbalanced magnetron sputtering, while creating an additional medium frequency discharge. We studied the changes in film growth process, microstructure, anti-bacterial effects. The results showed that TiO2 photocatalistic films were deposited successfully on the SUS304 substrate by unbalanced medium frequency magnetron sputtering thus generated the anti-bacterial feature. It indicates great application potential in the future on medical facilities.
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