The Unifcvmity Control of ITO Thin Film Deposition with RF Magnetron Sputtering and Wideband Dynamic Film Thickness Monitoring
碩士 === 輔仁大學 === 物理學系 === 93 === A dynamic film thickness control system/method and its coating method consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for realtime control over deposited film thickness and graduall...
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2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/32787167381523158601 |
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ndltd-TW-093FJU00198010 |
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ndltd-TW-093FJU001980102015-10-13T11:39:19Z http://ndltd.ncl.edu.tw/handle/32787167381523158601 The Unifcvmity Control of ITO Thin Film Deposition with RF Magnetron Sputtering and Wideband Dynamic Film Thickness Monitoring 全波段動態薄膜厚度監控裝置輔助磁控濺鍍ITO光學薄膜均勻度之研究 YU YING-CHING 余盈慶 碩士 輔仁大學 物理學系 93 A dynamic film thickness control system/method and its coating method consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for realtime control over deposited film thickness and gradually moves the mask plate according to the film thickness control value acquired by the film thickness control device. K.J.Ling 凌國基 2005 學位論文 ; thesis 75 zh-TW |
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NDLTD |
| language |
zh-TW |
| format |
Others
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NDLTD |
| description |
碩士 === 輔仁大學 === 物理學系 === 93 === A dynamic film thickness control system/method and its coating method consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for realtime control over deposited film thickness and gradually moves the mask plate according to the film thickness control value acquired by the film thickness control device.
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| author2 |
K.J.Ling |
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K.J.Ling YU YING-CHING 余盈慶 |
| author |
YU YING-CHING 余盈慶 |
| spellingShingle |
YU YING-CHING 余盈慶 The Unifcvmity Control of ITO Thin Film Deposition with RF Magnetron Sputtering and Wideband Dynamic Film Thickness Monitoring |
| author_sort |
YU YING-CHING |
| title |
The Unifcvmity Control of ITO Thin Film Deposition with RF Magnetron Sputtering and Wideband Dynamic Film Thickness Monitoring |
| title_short |
The Unifcvmity Control of ITO Thin Film Deposition with RF Magnetron Sputtering and Wideband Dynamic Film Thickness Monitoring |
| title_full |
The Unifcvmity Control of ITO Thin Film Deposition with RF Magnetron Sputtering and Wideband Dynamic Film Thickness Monitoring |
| title_fullStr |
The Unifcvmity Control of ITO Thin Film Deposition with RF Magnetron Sputtering and Wideband Dynamic Film Thickness Monitoring |
| title_full_unstemmed |
The Unifcvmity Control of ITO Thin Film Deposition with RF Magnetron Sputtering and Wideband Dynamic Film Thickness Monitoring |
| title_sort |
unifcvmity control of ito thin film deposition with rf magnetron sputtering and wideband dynamic film thickness monitoring |
| publishDate |
2005 |
| url |
http://ndltd.ncl.edu.tw/handle/32787167381523158601 |
| work_keys_str_mv |
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