High Density Plasma CVD Technology Development And Challenges
碩士 === 大葉大學 === 電機工程學系碩士在職專班 === 93 === Plasma-assisted deposition of thin films is widely used in microelectronic circuit manufacturing，Materials deposited dielectrics such as silicon oxide、silicon nitride、and doped silicon glass。 This paper reviews chemical vapor deposition (CVD) applications and...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/53276039246117852987 |