Study on the wear and corrosion properties of diamond films formed by CVD deposition

碩士 === 清雲科技大學 === 機械工程研究所 === 93 === The diamond film was deposited on silicon substrate by using a hot filament chemical vapor deposition method (HFCVD), the H2 and O2 gases were also added during the deposition processing. The purpose of this study is to evaluate the effect of H2 and O2 gases on t...

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Bibliographic Details
Main Authors: Tung-Yi Wu, 吳東益
Other Authors: Cheng-Kuo Lee
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/97358086867381871198