| Summary: | 碩士 === 清雲科技大學 === 機械工程研究所 === 93 === The diamond film was deposited on silicon substrate by using a hot filament chemical vapor deposition method (HFCVD), the H2 and O2 gases were also added during the deposition processing. The purpose of this study is to evaluate the effect of H2 and O2 gases on the wear, corrosion, and wear-corrosion resistance properties of the diamond films on silicon substrate. The atomic bonding types, structures, and surface morphologies of various diamond films were analyzed by Raman spectrometer, X-ray diffraction (XRD), and atomic force microscopy (AFM). Furthermore, the mechanical properties of diamond films were tested by a precision nano-indentation test instrument. The dry wear resistance of diamond films was evaluated in air at various different loads. The corrosion and wear-corrosion resistance of diamond films were performed in 1M H2SO4 + 1 M NaCl solution by using electrochemical polarization technique. The experimental results indicated that the diamond film under H2 addition was more dense surface and obvious diamond phase of sp3 bonding, increasing the hardness and improving the surface structure; consequently, increasing dry wear resistance, corrosion, and wear-corrosion resistance properties. However, the diamond film under O2 addition resulted the more sp2 and the less sp3 bonding, corresponding to the decreases of the wear, corrosion, and wear-corrosion resistance.
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