Using photoresist processing to fabricate the texturing anti-reflection structure of solar cells and polymer waveguides
碩士 === 中華大學 === 電機工程學系碩士班 === 93 === In this thesis, we use photoresist (PR) processing techniques to fabricate the anti-reflection texturing structures for solar cells and to construct the polymer waveguides. We demonstrate a simple method, combining conventional optical lithography and reactive io...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/19276985983775980605 |
| Summary: | 碩士 === 中華大學 === 電機工程學系碩士班 === 93 === In this thesis, we use photoresist (PR) processing techniques to fabricate the anti-reflection texturing structures for solar cells and to construct the polymer waveguides. We demonstrate a simple method, combining conventional optical lithography and reactive ion etching (RIE) processes to fabricate an optimized pyramid structure by tuning the defocusing distance and expose dosage of an optical stepper. The arrangement of pyramid is designed in hexagonal close packed (HCP) structure for different directions of sunray. Result shows the low-reflection with broad spectra regimes are obtained by varying defocusing distances in optical lithography processes. In addition, we use coupling wave method and FDTD(Finite-Difference Time-Domian) method to simulate the reflection spectra. Fabrication of polymer waveguide based on epoxy photoresist refractive index variation by using different exposure dose in optical lithography. Firstly, we grow a SiO2 layer used to be an isolation layer on silicon wafer. Then spin epoxy photoresist twice and use different exposure dose to fabricate core and cladding layers. We can complete the fabrication of polymer waveguide by using lithography but without etching and thin-film deposition processes.
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