Surface Morphology and Recrystallization Behaviour of Poly-Si after ArF Laser Irradiation
碩士 === 國防大學中正理工學院 === 兵器系統工程研究所 === 93 === Recently, the poly-silicon thin film on cheap and low temperature substrate has gained great attraction for being applied on the production of TFT-LCD panels, used on various high performance electronics devices, instead of amorphous-silicon thin film due t...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/26236058072517184228 |