Adhesion study of Hexamethyldisilazane(HMDS) with Lithography 248nm Photo-resist
碩士 === 國立臺北科技大學 === 有機高分子研究所 === 92 === As the size of device component continue to shrink, we gradually stride to the world of deep Nano scale. We have to confront the other challenge, the issue of resist critical dimension collapse. Recently, the research topics are focused on the improvement of p...
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| Format: | Others |
| Language: | zh-TW |
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2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/32783734682569065406 |