Copper CVD preparation in filling trenches under the iodine assistance
碩士 === 國立臺灣科技大學 === 化學工程系 === 92 === The theme of this thesis is to investigate the iodine effect in chemical vapor deposition of copper metal, which is a potential metallization technique in the back-end process in semiconductor manufacturing. The initial growth of copper, its surface reaction cons...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/09596923946511854926 |