The research of mask revise technology in area forming rapid prototyping system
碩士 === 國立臺灣科技大學 === 自動化及控制研究所 === 92 === As visual alignment shall be required for revision of the mask dimension of Area Forming Rapid Prototyping System, the operator has to revise the mask dimension under high-power light source, thus exerting an impact upon the accuracy of mask measurement. Duri...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/15107013910865081075 |