| Summary: | 碩士 === 國立臺灣大學 === 機械工程學研究所 === 92 === This thesis focuses on designing the mechanical structure and driven circuitry of electrostatic micromotors by utilizing the standard complementary metal-oxide semiconductor (CMOS) process. The pre-process uses 0.35um DPQM (Double Polysilicon Quadric Metal) CMOS process which was obtained from TSMC (Taiwan Semiconductor Manufacturing Company). Two post-processes are used to etch the selected sacrificial layers, thus releasing the suspended rotor. One process uses metal as the sacrificial layer etched by phosphoric acid. The other utilizes silicon oxide as the sacrificial layer etched by Hydrofluoric (HF).
Two methods of driven circuits are proposed. One uses the master-slave register circuit produces a three-phase signal (Q1、Q2、Q3), and utilizes the four-stage heap pump circuit generates voltage of up to about 25V. The other makes j-k flip-flop circuit and the four-stage heap pump circuit to create high voltage.
In our design, there are two rotors which have diameters of 50um and 100um with air gap, as defined by the distance between stator and rotor, 1um and 2um , respectively. We combine CMOS and MEMS (Micro-Electro-Mechanical System) technology to fabricate electrostatic micromotors, and create circuits and mechanisms which are embedded on a chip, thus improving efficiency and while reducing size (1.732mm*1.732mm ).
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