The Study on High Temperature Oxidation Resistance of γ-TiAl and α2-Ti3Al Intermetallics by Using Al-Sputtering Process
博士 === 國立臺灣大學 === 材料科學與工程學研究所 === 92 === The high temperature oxidation resistance of γ-TiAl and α2-Ti3Al intermetallics can be improved by sputtering an Al film and subsequent interdiffusion treatment at 600oC for 24hrs in high vacuum. In these conditions, a TiAl3 layer is formed on the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/65389553024383001092 |