Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor
碩士 === 國立臺灣海洋大學 === 電機工程學系 === 92 === In this thesis, the low cost IR furnace chemical vapor deposition system is used to obtain the ZnSe epilayers. The quality of ZnSe epilayers is analyzed by the XRD, SEM and photoluminescence (PL) measurement. The ZnSe epilayers was used to be the MSM photodetect...
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ndltd-TW-092NTOU54420552016-06-01T04:25:05Z http://ndltd.ncl.edu.tw/handle/47167248317308740865 Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor 硒化鋅異質磊晶層之銦錫氧化物電極金半金光檢測器整合N型金氧半電晶體研製 Sin-Bin Huang 黃信斌 碩士 國立臺灣海洋大學 電機工程學系 92 In this thesis, the low cost IR furnace chemical vapor deposition system is used to obtain the ZnSe epilayers. The quality of ZnSe epilayers is analyzed by the XRD, SEM and photoluminescence (PL) measurement. The ZnSe epilayers was used to be the MSM photodetectors and their electrode was used ITO and Au materials. In additions, a new annealing technology was found to enhance the transparency and conductivity of ITO layers. The MSM photodetectors has better photocurrent and the photoresponsivity also since the electrode improvement. In addition, MSM photodetectors and N-MOSFET are integrated to research the OEIC technology. The integrated technology is successful, In the future, in this experiment that this technique can be used to the OEIC fabrication. Chung-Cheng Chang 張忠誠 2004 學位論文 ; thesis 93 en_US |
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碩士 === 國立臺灣海洋大學 === 電機工程學系 === 92 === In this thesis, the low cost IR furnace chemical vapor deposition system is used to obtain the ZnSe epilayers. The quality of ZnSe epilayers is analyzed by the XRD, SEM and photoluminescence (PL) measurement.
The ZnSe epilayers was used to be the MSM photodetectors and their electrode was used ITO and Au materials. In additions, a new annealing technology was found to enhance the transparency and conductivity of ITO layers. The MSM photodetectors has better photocurrent and the photoresponsivity also since the electrode improvement.
In addition, MSM photodetectors and N-MOSFET are integrated to research the OEIC technology. The integrated technology is successful, In the future, in this experiment that this technique can be used to the OEIC fabrication.
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Chung-Cheng Chang |
author_facet |
Chung-Cheng Chang Sin-Bin Huang 黃信斌 |
author |
Sin-Bin Huang 黃信斌 |
spellingShingle |
Sin-Bin Huang 黃信斌 Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor |
author_sort |
Sin-Bin Huang |
title |
Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor |
title_short |
Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor |
title_full |
Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor |
title_fullStr |
Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor |
title_full_unstemmed |
Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor |
title_sort |
investigation of znse heteroepitaxy metal-semiconductor-metal photodetectors with ito electrode integrated with nmos transistor |
publishDate |
2004 |
url |
http://ndltd.ncl.edu.tw/handle/47167248317308740865 |
work_keys_str_mv |
AT sinbinhuang investigationofznseheteroepitaxymetalsemiconductormetalphotodetectorswithitoelectrodeintegratedwithnmostransistor AT huángxìnbīn investigationofznseheteroepitaxymetalsemiconductormetalphotodetectorswithitoelectrodeintegratedwithnmostransistor AT sinbinhuang xīhuàxīnyìzhìlěijīngcéngzhīyīnxīyǎnghuàwùdiànjíjīnbànjīnguāngjiǎncèqìzhěnghénxíngjīnyǎngbàndiànjīngtǐyánzhì AT huángxìnbīn xīhuàxīnyìzhìlěijīngcéngzhīyīnxīyǎnghuàwùdiànjíjīnbànjīnguāngjiǎncèqìzhěnghénxíngjīnyǎngbàndiànjīngtǐyánzhì |
_version_ |
1718290487637442560 |