Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor

碩士 === 國立臺灣海洋大學 === 電機工程學系 === 92 === In this thesis, the low cost IR furnace chemical vapor deposition system is used to obtain the ZnSe epilayers. The quality of ZnSe epilayers is analyzed by the XRD, SEM and photoluminescence (PL) measurement. The ZnSe epilayers was used to be the MSM photodetect...

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Main Authors: Sin-Bin Huang, 黃信斌
Other Authors: Chung-Cheng Chang
Format: Others
Language:en_US
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/47167248317308740865
id ndltd-TW-092NTOU5442055
record_format oai_dc
spelling ndltd-TW-092NTOU54420552016-06-01T04:25:05Z http://ndltd.ncl.edu.tw/handle/47167248317308740865 Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor 硒化鋅異質磊晶層之銦錫氧化物電極金半金光檢測器整合N型金氧半電晶體研製 Sin-Bin Huang 黃信斌 碩士 國立臺灣海洋大學 電機工程學系 92 In this thesis, the low cost IR furnace chemical vapor deposition system is used to obtain the ZnSe epilayers. The quality of ZnSe epilayers is analyzed by the XRD, SEM and photoluminescence (PL) measurement. The ZnSe epilayers was used to be the MSM photodetectors and their electrode was used ITO and Au materials. In additions, a new annealing technology was found to enhance the transparency and conductivity of ITO layers. The MSM photodetectors has better photocurrent and the photoresponsivity also since the electrode improvement. In addition, MSM photodetectors and N-MOSFET are integrated to research the OEIC technology. The integrated technology is successful, In the future, in this experiment that this technique can be used to the OEIC fabrication. Chung-Cheng Chang 張忠誠 2004 學位論文 ; thesis 93 en_US
collection NDLTD
language en_US
format Others
sources NDLTD
description 碩士 === 國立臺灣海洋大學 === 電機工程學系 === 92 === In this thesis, the low cost IR furnace chemical vapor deposition system is used to obtain the ZnSe epilayers. The quality of ZnSe epilayers is analyzed by the XRD, SEM and photoluminescence (PL) measurement. The ZnSe epilayers was used to be the MSM photodetectors and their electrode was used ITO and Au materials. In additions, a new annealing technology was found to enhance the transparency and conductivity of ITO layers. The MSM photodetectors has better photocurrent and the photoresponsivity also since the electrode improvement. In addition, MSM photodetectors and N-MOSFET are integrated to research the OEIC technology. The integrated technology is successful, In the future, in this experiment that this technique can be used to the OEIC fabrication.
author2 Chung-Cheng Chang
author_facet Chung-Cheng Chang
Sin-Bin Huang
黃信斌
author Sin-Bin Huang
黃信斌
spellingShingle Sin-Bin Huang
黃信斌
Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor
author_sort Sin-Bin Huang
title Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor
title_short Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor
title_full Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor
title_fullStr Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor
title_full_unstemmed Investigation of ZnSe Heteroepitaxy Metal-Semiconductor-Metal Photodetectors with ITO Electrode Integrated with NMOS Transistor
title_sort investigation of znse heteroepitaxy metal-semiconductor-metal photodetectors with ito electrode integrated with nmos transistor
publishDate 2004
url http://ndltd.ncl.edu.tw/handle/47167248317308740865
work_keys_str_mv AT sinbinhuang investigationofznseheteroepitaxymetalsemiconductormetalphotodetectorswithitoelectrodeintegratedwithnmostransistor
AT huángxìnbīn investigationofznseheteroepitaxymetalsemiconductormetalphotodetectorswithitoelectrodeintegratedwithnmostransistor
AT sinbinhuang xīhuàxīnyìzhìlěijīngcéngzhīyīnxīyǎnghuàwùdiànjíjīnbànjīnguāngjiǎncèqìzhěnghénxíngjīnyǎngbàndiànjīngtǐyánzhì
AT huángxìnbīn xīhuàxīnyìzhìlěijīngcéngzhīyīnxīyǎnghuàwùdiànjíjīnbànjīnguāngjiǎncèqìzhěnghénxíngjīnyǎngbàndiànjīngtǐyánzhì
_version_ 1718290487637442560