Near-field Imaging of Optical Recording Marks
碩士 === 國立臺灣師範大學 === 光電科技研究所 === 92 === It is interesting to observe recording marks of phase-change optical disks. In this paper, we measured topography and near-field optical imaging of the recording layer by near-field optical scanning microscope (NSOM). First, we used the static tester...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/11403537786111028770 |
| Summary: | 碩士 === 國立臺灣師範大學 === 光電科技研究所 === 92 === It is interesting to observe recording marks of phase-change optical disks. In this paper, we measured topography and near-field optical imaging of the recording layer by near-field optical scanning microscope (NSOM).
First, we used the static tester writing recording marks in phase change optical layer (Ge2Sb2Te5). The structure of the sample is Glass\ZnS-SiO2(130nm)\Ge2Sb2Te5(20nm)\ZnS-SiO2(20nm). We changed the writing power and the writing time. Studying different writing conditions, we can understand thermal effects of recording layer.
Then, we observe recording marks in commercial optical disks using NSOM. From near-field optical imaging, we obtained higher resolution and observed optical recording marks smaller than 200nm.
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