The Study of Microstructure of TiO2 Thin Films grown by Dual Ion Beam Sputtering System

• Main Authors: Chun-hsiang Li, 李俊翔
• Other Authors: Der-shin Gan
• Format: Others
• Language: zh-TW
• Published: 2004
• Online Access: http://ndltd.ncl.edu.tw/handle/07979537510792421231

碩士 === 國立中山大學 === 材料科學研究所 === 92 === Abstract Recently, titanium dioxide（TiO2） is one of the most extensively studied transition-metal oxides because of its remarkable photocatalyst efficiency and electronic properties. In this paper, thin films ware obtained by dual ion beam sputtering. By different processes, these samples can be classified into three categories. Firstly, thin films, deposited on 200 mash copper grids for 15 minutes, were investigated that many TiO grains is about 5 nm in size by transmission electron microscopy（TEM）. Next, TiO2 thin films, sputtered on si wafers and glass for 180 minutes in an O2 environment by using titanium target, were initially identified by X ray diffraction instrument（XRD）. The result shows that some thin films have good orientations. By TEM, TiO2 grains on bottom of films are about 20 nm. By scanning electron microscopy（SEM）, TiO2 grains on the surface are about 1~2 μm in size and are oblong in shape. The last, TiO thin films were directly deposited on si wafer for 180 minutes in no O2 environment by using titanium target and then annealed to transform from TiO to TiO2. By XRD, the thin film, annealed at 600℃ for 1hr, has good orientation. By TEM, TiO2 grains, annealed at 1000℃ for 24hr, grow up to 1-2 μm in size and are oblong in shap.