Optical monitoring of thin-film through admittance diagram
碩士 === 國立中央大學 === 光電科學研究所 === 92 === Optical monitoring is the main method for determinating film thickness. Unlike monitoring by runsheet diagram, we raise a new method by admittance diagram. Runsheet has some popular defects such as diffcult to determinate the extreme point and ineffectiveness o...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/02696104381776448362 |
| Summary: | 碩士 === 國立中央大學 === 光電科學研究所 === 92 === Optical monitoring is the main method for determinating film thickness. Unlike monitoring by runsheet diagram, we raise a new method by admittance diagram.
Runsheet has some popular defects such as diffcult to determinate the extreme point and ineffectiveness of observing film growth. Admittance diagram not only overcome these defects, but can oberve the variation of phase thickness.
In this thesis, we vertify these qualities mathematically and by experiment. And real-time compensating by the property observing phase
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