Bonding Process for the Vibrating Ring Gyro

碩士 === 國立交通大學 === 機械工程系所 === 92 === Anodic bonding is a quite popular process used in fabricating micro sensors since it is a glass-to-silicon bonding process with reliable bonding strength in lower temperature (<500℃). It is applied in the fabrication of our vibrating ring gyro, but we suffered...

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Main Authors: Pin-Tso Cheng, 鄭斌佐
Other Authors: Wei-Hua Chieng
Format: Others
Language:en_US
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/9dw8jn
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spelling ndltd-TW-092NCTU54890502019-05-15T19:38:01Z http://ndltd.ncl.edu.tw/handle/9dw8jn Bonding Process for the Vibrating Ring Gyro 振動式環形微陀螺儀接合製程 Pin-Tso Cheng 鄭斌佐 碩士 國立交通大學 機械工程系所 92 Anodic bonding is a quite popular process used in fabricating micro sensors since it is a glass-to-silicon bonding process with reliable bonding strength in lower temperature (<500℃). It is applied in the fabrication of our vibrating ring gyro, but we suffered the problem that the part of non-bonding region was bonded to glass. We rough the non-bonding region to reduce the situation that non-bonding region was boned to glass. Initially, we used the thick photoresist (PR) as DRIE process mask, but the photoresist reflow is very serious. It will influence the width and the depth of the structural gap. We use SiO2 instead of thick PR as DRIE etching mask and successfully solve the PR reflow problem. Wei-Hua Chieng 成維華 2004 學位論文 ; thesis 54 en_US
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description 碩士 === 國立交通大學 === 機械工程系所 === 92 === Anodic bonding is a quite popular process used in fabricating micro sensors since it is a glass-to-silicon bonding process with reliable bonding strength in lower temperature (<500℃). It is applied in the fabrication of our vibrating ring gyro, but we suffered the problem that the part of non-bonding region was bonded to glass. We rough the non-bonding region to reduce the situation that non-bonding region was boned to glass. Initially, we used the thick photoresist (PR) as DRIE process mask, but the photoresist reflow is very serious. It will influence the width and the depth of the structural gap. We use SiO2 instead of thick PR as DRIE etching mask and successfully solve the PR reflow problem.
author2 Wei-Hua Chieng
author_facet Wei-Hua Chieng
Pin-Tso Cheng
鄭斌佐
author Pin-Tso Cheng
鄭斌佐
spellingShingle Pin-Tso Cheng
鄭斌佐
Bonding Process for the Vibrating Ring Gyro
author_sort Pin-Tso Cheng
title Bonding Process for the Vibrating Ring Gyro
title_short Bonding Process for the Vibrating Ring Gyro
title_full Bonding Process for the Vibrating Ring Gyro
title_fullStr Bonding Process for the Vibrating Ring Gyro
title_full_unstemmed Bonding Process for the Vibrating Ring Gyro
title_sort bonding process for the vibrating ring gyro
publishDate 2004
url http://ndltd.ncl.edu.tw/handle/9dw8jn
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