Quantum Correction Modeling and Simulation of Nanoscale Metal-Oxide-Semiconductor Devices

碩士 === 國立交通大學 === 電子物理系所 === 92 === Diverse device structures have been recently proposed explored, and found better characteristics than that of conventional used single-gate (SG) metal-oxide-semiconductor field-effect-transistors (MOSFETs). Among them, the double-gate (DG) MOSFETs and gate-all-ar...

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Bibliographic Details
Main Author: 湯乾紹
Other Authors: 趙天生
Format: Others
Language:en_US
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/36754767776253785676