Effects of C2H5I Catalyst on the Property of Cu Chemical Vapor Deposition
碩士 === 國立交通大學 === 電子工程系所 === 92 === This thesis studies of the effects of C2H5I catalyst on the copper chemical vapor deposition (Cu CVD), including Cu nucleation, Cu film property, and via-filling capability, using a liquid metalorganic compound of Cu(hfac)TMVS with 2.4 wt% TMVS additive as the pre...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/3ygh54 |