The Investigation and Application of Advanced Oxynitride and Novel Stack Gate Dielectrics
博士 === 國立交通大學 === 電子工程系 === 92 === This dissertation proposes two oxynitridation methods for fabricating 1.0 nm ultrathin oxynitride films and applies these techniques to novel stack gate dielectrics. In Chapter 2, ultrathin 1.0 nm oxynitride dielectric films were grown by rapid thermal p...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/46324928740209645352 |