Three Dimensional Simulation of FinFET

碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 92 ===   As the feature size of VLSI is scaling down, the influence of gate electrode on channel conductivity decreases significantly. In addition, the punch-through effect becomes much serious, which strongly degrades the device performance. To overcome such probl...

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Bibliographic Details
Main Authors: Wen-Yong Jiang, 江文湧
Other Authors: Shui-Jinn Wang
Format: Others
Language:en_US
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/58553091399916534057