Ultra Low Temperature growth of CNTs by Microwave Plasma CVD and its use in Micro-scale Heat Transfer Cooling

碩士 === 國立成功大學 === 航空太空工程學系碩博士班 === 92 ===   The objective of this work is to grow well-alignment and high degree of graphitization of CNTs at ultra low temperature. In the present work here, we have succeeded in varying such parameters as the Ni thickness, the MW power, the growth time and the pretr...

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Bibliographic Details
Main Authors: Shou-De Chen, 陳守得
Other Authors: Chie Gau
Format: Others
Language:zh-TW
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/95895725824638673708