Investigation and Characterization of Fluorine Modified Organosilicate Glass for Low Dielectric Constant Material Application in Ultra-Large Scale Integrated Circuit
博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 92 === The objective of this study is to investigate and develop a suitable low dielectric material (Low-k) and its integration for the application of the deep submicron ultra-large scale integrated circuits (ULSI). The fluorine-modified organosilicate glass (FO...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/23593937941574686842 |