| Summary: | 碩士 === 國立成功大學 === 化學系碩博士班 === 92 === The thermal reactions and surface intermediates of HSCH2CH2OH on Cu(100) and Cu(111) under ultra-high vacuum have been studied by temperature-programmed reaction/desorption (TPR/D), X-ray photoelectron spectroscopy (XPS), and reflection-absorption infrared spectroscopy. In the case of Cu(111), -SCH2CH2OH is generated from HSCH2CH2OH dissociative adsorption on Cu(111) below 123K. At lower coverages, -SCH2CH2OH transforms to -SCH2CH2O-, a cyclic intermediate between 223-323K. Above 350K, -SCH2CH2O- decomposes to form carbon-containing products of CH4, C2H4, and CH3CHO. The relative amount of these two intermediates is dependent on temperature and surface coverage. In the case of Cu(100), thermal decomposition of HSCH2CH2OH is similar to Cu(111) and produces intermediates of -SCH2CH2OH, -SCH2CH2O-, and surface species containing C=C=O or C=C=S. Carbon-containing products of CH4, C2H4, and CH3CHO evolve between 300-400K. Desorption of sulfur-containing products are not observed in both cases.
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