Research of High Aspect Ratio Electroforming Technology and Replication Process

博士 === 國立中興大學 === 機械工程學系 === 92 === The major goal of this study is to investigate the high-aspect-ratio electroforming technique. Three fundamental difficulties are encountered in the microstructure electroforming: electrolyte filling, fast ion consumption rate, and poor structure streng...

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Main Authors: Tsung-Hsun Tsai, 蔡宗勳
Other Authors: Reiyu Chein
Format: Others
Language:zh-TW
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/80336635010648849237
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spelling ndltd-TW-092NCHU04890162016-06-17T04:16:36Z http://ndltd.ncl.edu.tw/handle/80336635010648849237 Research of High Aspect Ratio Electroforming Technology and Replication Process 高深寬比微電鑄技術與複製過程研究 Tsung-Hsun Tsai 蔡宗勳 博士 國立中興大學 機械工程學系 92 The major goal of this study is to investigate the high-aspect-ratio electroforming technique. Three fundamental difficulties are encountered in the microstructure electroforming: electrolyte filling, fast ion consumption rate, and poor structure strength. The strategies for solving these three problems are reported in this study. First, the influence of centrifugal force and surface tension on the fluid filling processes in high-aspect-ratio micromold is addressed. Under certain high rotation speed of the filling system, efficient filling can be attained regardless surface is hydrophilic or hydrophobic. Second, a theoretical model that predicts the metal ion concentration distribution during electroforming high aspect ratio microstructures (HARM) is built. The applied current density and microstructure aspect ratio were found as two important factors that affect the electroforming outcome. The analytical results are verified using electroforming microstructural posts experiments. Good agreement was obtained between the experimental and analytical solutions. Third, a new microelectroforming technique using air-pressure assistance in the electrolyte is developed. The related theories show that ion diffusivity can be increased and surface tension can be reduced by increasing the bulk electrolyte pressure. These two positive effects can help to obtain successful outcomes on high aspect ratio microstructure electroforming. The pressurized electrolyte reduces hydrogen bubble formation and defect on the substrate surface. The experimental results show that the metallurgical grains were finer when higher pressures were applied in the electrolyte based on SEM micrographs. Moreover, pressurized electroforming can increase the allowable current density which can shorten plating time in the LIGA process. The surface morphology of pressurized electroformed samples and hardness were improved compared with the conventional method. Based on these positive effects, Ni post arrays microstructures with HAR=12 in 85μm diameter is realized by using pressurized electroforming. Reiyu Chein Hsiharng Yang 簡 瑞 與 楊 錫 杭 2004 學位論文 ; thesis 76 zh-TW
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description 博士 === 國立中興大學 === 機械工程學系 === 92 === The major goal of this study is to investigate the high-aspect-ratio electroforming technique. Three fundamental difficulties are encountered in the microstructure electroforming: electrolyte filling, fast ion consumption rate, and poor structure strength. The strategies for solving these three problems are reported in this study. First, the influence of centrifugal force and surface tension on the fluid filling processes in high-aspect-ratio micromold is addressed. Under certain high rotation speed of the filling system, efficient filling can be attained regardless surface is hydrophilic or hydrophobic. Second, a theoretical model that predicts the metal ion concentration distribution during electroforming high aspect ratio microstructures (HARM) is built. The applied current density and microstructure aspect ratio were found as two important factors that affect the electroforming outcome. The analytical results are verified using electroforming microstructural posts experiments. Good agreement was obtained between the experimental and analytical solutions. Third, a new microelectroforming technique using air-pressure assistance in the electrolyte is developed. The related theories show that ion diffusivity can be increased and surface tension can be reduced by increasing the bulk electrolyte pressure. These two positive effects can help to obtain successful outcomes on high aspect ratio microstructure electroforming. The pressurized electrolyte reduces hydrogen bubble formation and defect on the substrate surface. The experimental results show that the metallurgical grains were finer when higher pressures were applied in the electrolyte based on SEM micrographs. Moreover, pressurized electroforming can increase the allowable current density which can shorten plating time in the LIGA process. The surface morphology of pressurized electroformed samples and hardness were improved compared with the conventional method. Based on these positive effects, Ni post arrays microstructures with HAR=12 in 85μm diameter is realized by using pressurized electroforming.
author2 Reiyu Chein
author_facet Reiyu Chein
Tsung-Hsun Tsai
蔡宗勳
author Tsung-Hsun Tsai
蔡宗勳
spellingShingle Tsung-Hsun Tsai
蔡宗勳
Research of High Aspect Ratio Electroforming Technology and Replication Process
author_sort Tsung-Hsun Tsai
title Research of High Aspect Ratio Electroforming Technology and Replication Process
title_short Research of High Aspect Ratio Electroforming Technology and Replication Process
title_full Research of High Aspect Ratio Electroforming Technology and Replication Process
title_fullStr Research of High Aspect Ratio Electroforming Technology and Replication Process
title_full_unstemmed Research of High Aspect Ratio Electroforming Technology and Replication Process
title_sort research of high aspect ratio electroforming technology and replication process
publishDate 2004
url http://ndltd.ncl.edu.tw/handle/80336635010648849237
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