Optical Properties and Microstructure of Ta2O5-x Thin Films Prepared by RF Sputtering
碩士 === 國立中興大學 === 材料工程學研究所 === 92 === Low temperature coating technology for depositing thin films on flexible substrates is one of the most important issues in flat panel displays (FPD) research. Tantalum pentoxide (Ta2O5-X) thin films belong to high-valence oxides, having low optical lo...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13102273136473092390 |