| Summary: | 碩士 === 中原大學 === 化學工程研究所 === 92 === One of the advantages of organic light-emitting diodes (OLEDs) over other display technologies is the ability to fabricate them on flexible substrate. But flexible OLED need a thin-film barriers on both the bottom and top side of the device layers for sufficient lifetimes. In this study, the barriers were prepared by use of TEOS and O2 in a capacitive coupled RF PECVD system. The barriers of silica composite membrane were deposited by changing the precursor flow rate in one reactor.
The effects of operating parameters (including RF power, deposition time and precursor flow ratio) on the silica film’s structure were investigated. Under the optimal condition, the water vapor transmission rate (WVTR) of silica composite membrane was 3.4 g/day-m2, and the SIMS’s analysis demonstrated the change of barrier’s chemical composition by controlling the precursor flow ratio. Moreover, CF4 plasma post-treatment caused etching effect to barrier layers, but CF4/CH4 plasma post-treatment deposited highly cross-linked C-C films, resulting in the decreasing of WVTR. According to the series resistance model, the water vapor transmission flux of PET was 6200 and 11500 times of the monolayer barrier and the multilayer barrier, respectively. Finally, the silica composite membranes prepared on OLED were found to extend the lifetime of OLED.
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