Interface properties of ultra-thin HfO2 gate dielectrics on Tensile strained-SiC/Si heterostructure
碩士 === 長庚大學 === 電子工程研究所 === 92 ===
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/54311608131505650185 |