Key Technology Study of Flash Devices
博士 === 國防大學中正理工學院 === 國防科學研究所 === 92 === When searching the structure for next-generation Flash memory application, SONOS (Silicon-Oxide-Nitride-Oxide-Silicon) structure has attracted much attention among various choices due to its numerous advantages. However, there are still some challenges remain...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52936198026146157079 |