Study of field emission characteristic of DLC film on glass substrate by reactive R.F. sputtering deposition

• Main Authors: Yung Chih Yu, 俞勇志
• Other Authors: Jyi-Tsong Lo
• Format: Others
• Language: en_US
• Published: 2003
• Online Access: http://ndltd.ncl.edu.tw/handle/16420954585482003788

碩士 === 大同大學 === 光電工程研究所 === 91 === Our purpose is to discuss the field emission characteristics of diamond-like carbon films on glass substrates. We have successfully used chromium as the cathode electrode and buffer layer, which provides better conductivity and adhesion of the DLC films on glass substrates. Therefore, large size field emission display is possible to manufacture on glass substrates. In the process of DLC films deposition, reactive gas CH4 was introduced to increase the surface roughness and sharpness of the DLC films to improve the field emission characteristics. In addition, we also change the deposition parameters of the DLC films, including deposition temperature, R.F. power, working pressure and gas ratio to find the optimum deposition conditions for the field emission behavior. In the I-V experiments of diode type and triode type emitter, we found that there are a few locations that have field current to result in field emission behavior in the diode type. On the other hand, the gate electrode providing a uniform electric field, however, makes a lot of emitters to tunnel out electrons and improves the field emission behavior in the triode type. The anode electrode obtains a high current density of 0.71mA/cm2 (at gate voltage of 35 V and anode voltage of 850 V).