An Experimental and Numerical Study of the Nitrogen Purge Processes for the Front
碩士 === 國立臺北科技大學 === 冷凍與低溫科技研究所 === 91 === Today the contamination control of semiconductor manufacturing processes changes quickly from particle contamination to Airborne Molecular Contamination (AMC). Many researches reveal that the quantity of AMC and the cleanliness level the clean room do not ha...
Main Authors: | LIN HUNG-CHUNG, 林鴻忠 |
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Other Authors: | Shih Cheng Hu |
Format: | Others |
Language: | zh-TW |
Published: |
2003
|
Online Access: | http://ndltd.ncl.edu.tw/handle/25318246497495384313 |
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