The Application of Ozone Water on the Semiconductor Cleaning
碩士 === 國立臺北科技大學 === 材料及資源工程系碩士班 === 91 === In semiconductor manufacturing, the cleaning is an important process. It has big influences on device characteristics. The traditional cleaning process is RCA cleaning. It includes several main steps and each has its function. For example, the H2SO4 and H2O...
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| Format: | Others |
| Language: | zh-TW |
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2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/64538522037060026837 |