| Summary: | 碩士 === 國立臺灣大學 === 機械工程學研究所 === 91 === The main purpose of this thesis is to develop a bimorph beam structure which can be used in the manufacture of micro accelerometer.
In the design of structure, the axial stress within the beam will be reduced by the direction of the beam supporting the proof mass. We also analysis the natural frequency of the whole structure.
The etching stop of the silicon micro-machining in TMAH is dependent on the Au/Si junction and the reversed-bias of P-N junction, making the selectivity of n-type epilayer from p-type substrate. The p-type proof mass and the n-type epilayer supporting beam are formed at the same time. In addition, considering the isotropic property of TMAH etching, the proper corner compensation of the shape is required. Finally, we will discuss the effect of the shape and the covering area of Au from the experiment of Au/Si junction etching stop in TMAH.
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