Fabrication of Microchannels Using Thick Photoresist as Sacrificial Layers with SU-8 as Channel Structures

• Main Authors: Chih- Hsien Yang, 楊志賢
• Other Authors: P. T. Chen
• Format: Others
• Language: zh-TW
• Published: 2003
• Online Access: http://ndltd.ncl.edu.tw/handle/60598973989624987748

碩士 === 國立海洋大學 === 系統工程暨造船學系 === 91 === The study applies micro-electro-mechanical-system technology to fabricate microchannel biomedical chip. We expect this framework is an attempt to combine the capabilities such as sample loading, drop metering, thermal reaction, separate and photodetectors to a complete single chip biomedical system. This microchannel system chip adopts sacrificial layer technique to fabricate SU-8 thick film structures. Using photolithography and chemical wet etching and various positive and negative photoresists conduct the processes of fabrication. It provides low cost, simple processes of fabrication. The materials of sacrificial layer are positive photoresist AZ4620 to form a thickness of 24μm. The material of SU-8 is used to form channel structures of a thickness 48μm. Since both the sacrificial and structure layers are photosensitive material, proper controlling exposure times yield the microchannels. The study is also aimed at stick phenomena when the sacrificial layer is etched . When eliminating this layer, we used different surface tension solution (isopropanol, acetone and DI-water) to avoid adhesive and collapse phenomena.