| Summary: | 碩士 === 國立臺灣師範大學 === 工業教育研究所 === 91 === LIGA process, which combines x-ray deep lithography, electroforming and micromolding techniques, is a major method for fabricating sub-micro microstructures with very high aspect ratio and batch production. However, standard LIGA whose lithographic source is x-ray synchrotron radiation is high cost, complex procedure and time-consuming. Thus several analogous processes, including UV-LIGA and Laser-LIGA processes, have been developed to overpass the barrier.
In our work, we have developed electrostatic optical switch which was used UV-LIGA and thick film process. Optical switch was used one set of masks for two processes. One was all SU-8 thick film process, another was UV-LIGA combined SU-8 thick film process. We have finished optical switch which was all in one not assembled. Advantages of optical switch are low cost, decrease micro structures assembled tolerances and increase active range of micromirror by being driven indirectly.
In our study, Actuators of optical switch which was sputtered metal are driven by AC 125V. Reflective ratio of micromirror is 17.6% in visible wavelength (632nm) and 20.5% in IR wavelength (1550nm).
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