Study of Thermal Flow Processes and Deep Sub-micron of Metal Silicided Gate Processes by Electron Beam Lithography
碩士 === 國立清華大學 === 電子工程研究所 === 91 === This thesis contains two parts. First, electron beam resist properties and resist flow processes are studied. Above all, we use electron beam to define resist pattern, and compare E-beam resist (DSE1010) and DUV resist (UV135) for electron beam lithographic appli...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/41476231274254705663 |