Machine Assignment, Order Releasing and Dispatching Policies in Photolithographic Area Under Critical Layer Constraints

碩士 === 國立清華大學 === 工業工程與工程管理學系 === 91 === In semiconductor manufacturing, critical layers of a wafer lot often required to be processed at the same photolithographic machine in order to meet stringent cross-layer registration requirement. Non-critical layers do not have such requirement. I...

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Bibliographic Details
Main Authors: Shu-Ching Yu-, 游淑晴
Other Authors: D. Daniel Sheu
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/86257572645111955340