The study of Characteristics of Low-Temperature Polycrystalline Silicon thin film Prepared by Metal Induced Crystallization
碩士 === 國立中央大學 === 光電科學研究所 === 91 === In the study, the amorphous silicon (a-Si) thin film deposited on SiO2/Si substrate by Laser Assisted Plasma Enhanced Chemical Vapor Deposition(LAPECVD) was crystallized during annealing process at low temperature by Ni-induced crystallization. Ni film was t...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/91713764462015491072 |