Design and Fabrication of Subwavelength Metal-stripe Gratings by E-beam Lithography Technology

• Main Authors: Yuan-Lung Huang, 黃裕龍
• Other Authors: G. C. Chi
• Format: Others
• Language: zh-TW
• Published: 2003
• Online Access: http://ndltd.ncl.edu.tw/handle/91727911528447736897

碩士 === 國立中央大學 === 光電科學研究所碩士在職專班 === 91 === One method for influencing the polarization of light is the use of wire-grid polarizers. For the visible region, this type of element can be realized as a metal-stripe grating with periods less than the wavelength. We fabricate metal-stripe gratings with periods down to 0.3um in thin gold layers of 98nm thickness using electron-beam lithography technology. A detailed investigation of the influence of grating period and duty cycle on the polarization effect is carried out to verify the conformity of rigorous diffraction theory and experimental results. The comparison between the two indicates good performance. Polarization ratios of the order of 2.3 with reflection efficiencies of about 60% in TM polarization are obtained. .