Geometric Analysis of Photolithography Overlay Error Using Neural Networks
碩士 === 中原大學 === 機械工程研究所 === 91 === Photolithography is the key process of IC manufacturing and directly influences the limit of critical dimension (CD). The alignment and exposure represents two major technologies in modern photolithography. During the exposure stage the circuit patterns between two...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/d77b46 |