High-aspect-ratio structure fabricated with two-photon photopolymerization

碩士 === 國立中正大學 === 物理系 === 91 === Two-photon photopolymerization can be used to fabricate three-dimensional objects with sub-diffraction-limit resolution. The feature size can achieve the specifications of two-dimensional photonic crystals. With appropriate pattern-transfer techniques, the patterns m...

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Bibliographic Details
Main Author: 張庭瑋
Other Authors: 林俊元
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/34689885811489816599