Method to Improve the Throughput and Retain the CD Performance for DUV Process
碩士 === 國立臺北科技大學 === 生產系統工程與管理研究所 === 90 === Chemically amplified resist based on acid catalysis for DUV(Deep Ultra-violet) li-thography is a promising technology for patterns of 0.2 um or less. Linewidth varia-tion is mainly induced by the effect of acid diffusion during PED or by the ne...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/00663784262976040169 |