Study on Synthesis and Lithographic Performance of 193nm Negative-tone Photoresist for IC Process
碩士 === 國立臺灣大學 === 化學工程學研究所 === 90 === In previous study, the researcher discovered that the acrylate resist with tert-alcohol group could process dehydrating and followed by crosslinking reaction under acid conditions. After modulating resin compositions and lithographic terms carefully, the photore...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/78124210512674811434 |