X-Ray Diffraction Characterization of the Thermal Annealing Effects on InxGa1-xN-GaN MQWs

碩士 === 國立清華大學 === 工程與系統科學系 === 90 === We apply X-ray diffraction to characterize the structure of InxGa1-xN-GaN MQWs and study the effect of thermal-annealing from the structural point of view. Surface-normal (00.2) and (00.4) diffraction profiles were collected and analyzed by numerical...

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Bibliographic Details
Main Authors: Chu-Ching Tsai, 蔡竹青
Other Authors: Hsueh-Hsing Hung
Format: Others
Language:en_US
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/38270239579124966376