The Study of Cu Films Deposited by Photo-Assisted CVD at Low Temperature

碩士 === 國立清華大學 === 電子工程研究所 === 90 ===

Bibliographic Details
Main Authors: Ming-Hsuan Hsieh, 謝明玹
Other Authors: Huey-Liang Hwang
Format: Others
Language:en_US
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/55753483778784073565
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spelling ndltd-TW-090NTHU04280502015-10-13T10:34:06Z http://ndltd.ncl.edu.tw/handle/55753483778784073565 The Study of Cu Films Deposited by Photo-Assisted CVD at Low Temperature 利用光輔助化學氣相沉積技術在低溫下製作VLSI銅連接之銅膜 Ming-Hsuan Hsieh 謝明玹 碩士 國立清華大學 電子工程研究所 90 Huey-Liang Hwang 黃惠良 2002 學位論文 ; thesis 50 en_US
collection NDLTD
language en_US
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 電子工程研究所 === 90 ===
author2 Huey-Liang Hwang
author_facet Huey-Liang Hwang
Ming-Hsuan Hsieh
謝明玹
author Ming-Hsuan Hsieh
謝明玹
spellingShingle Ming-Hsuan Hsieh
謝明玹
The Study of Cu Films Deposited by Photo-Assisted CVD at Low Temperature
author_sort Ming-Hsuan Hsieh
title The Study of Cu Films Deposited by Photo-Assisted CVD at Low Temperature
title_short The Study of Cu Films Deposited by Photo-Assisted CVD at Low Temperature
title_full The Study of Cu Films Deposited by Photo-Assisted CVD at Low Temperature
title_fullStr The Study of Cu Films Deposited by Photo-Assisted CVD at Low Temperature
title_full_unstemmed The Study of Cu Films Deposited by Photo-Assisted CVD at Low Temperature
title_sort study of cu films deposited by photo-assisted cvd at low temperature
publishDate 2002
url http://ndltd.ncl.edu.tw/handle/55753483778784073565
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