The study of temperature oefficient of SAW frequency for AlN thin films on LiNbO3 and ST-quartz
碩士 === 國立中山大學 === 電機工程學系研究所 === 90 === In this study, we use the reactive rf magnetron sputtering method with deposition parameters of RF power of 370W, sputtering pressure of 15 mTorr, substrate temperature of 400℃, nitrogen concentration (N2/N2+Ar) of 30% and 40%, to deposit highly c-axis orientat...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/35383786811229108056 |