Characterization of Sputterd ZrN Thin Film
碩士 === 國立中山大學 === 材料科學研究所 === 90 === Abstract In this study, ZrN films were deposited on silicon wafer、copper and aluminum sheets by reactive sputtering of Zr target at room temperature in a mixed N2-Ar atmosphere with N2 gas flow rates of 5 and 6 sccm. Films of ZrN about 1μm thick were annealed at...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2002
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| Online Access: | http://ndltd.ncl.edu.tw/handle/88016112336408465417 |