Electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic atomization process
碩士 === 國立中山大學 === 材料科學研究所 === 90 === The thin film deposition system using ultrasonic nebulization was adopted in this study. SnCl4.5H2O, SbCl3, and TaCl5 were used as solutes. Ethanol was used as the solvent. Solutions of different Sn4+ concentration, Sb concentration (Sb/Sn atomic ratio) in Sn, an...
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ndltd-TW-090NSYS51590142015-10-13T12:46:51Z http://ndltd.ncl.edu.tw/handle/99919811646719652559 Electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic atomization process 以超音波霧化法製備之銻及鉭摻雜氧化錫薄膜之光電特性 Shang-Chien Li 李尚謙 碩士 國立中山大學 材料科學研究所 90 The thin film deposition system using ultrasonic nebulization was adopted in this study. SnCl4.5H2O, SbCl3, and TaCl5 were used as solutes. Ethanol was used as the solvent. Solutions of different Sn4+ concentration, Sb concentration (Sb/Sn atomic ratio) in Sn, and Ta concentration (Ta/Sn atomic ratio) in Sn were mixed. The mist was generated from a solution by the agitation of an ultrasonic device operating at about 1.65MHz. The mist was carried to the heated substrate (corning 7059 glass) by the flow of nitrogen gas so that it was decomposed by heat. SnO2-x films were deposited on the substrate due to the pyrolysis reaction. The experiment included six series: Sn4+ concentration series, Sb-doping series, temperature series, Ta-doping series, aging time series and nebulization rate series. SnO2-x films were analyzed by XRD, UV-Visible, SEM, and Hall-measurement. The optimum deposition conditions were obtained through analyses of these six series. The film deposition rate of nonaged solution was faster than aged solution. When the nebulization rate of solution was 1.6 ml/min, the resistivity of undoped SnO2 film obtained with the substrate kept at 450 oC is 2.364×10-2Ω-cm and the maximum transmittance of the visible light is 78.7%. When Sb/Sn atomic ratio in the solution was 2%, the resistivity of Sb doped SnO2 film obtained with the substrate kept at 525 oC is 2.77×10-3Ω-cm and the maximum transmittance of the visible light is 71% . When Ta/Sn atomic ratio in the solution was 0.1%, the resistivity of Ta doped SnO2 film obtained with the substrate kept at 450 oC is 3.917×10-2Ω-cm and the maximum transmittance of the visible light is 85% In this study, the electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic nebulization process were reported and discussed carefully through film characterizations. Bing-Hwait Hwang 黃炳淮 2002 學位論文 ; thesis 120 zh-TW |
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碩士 === 國立中山大學 === 材料科學研究所 === 90 === The thin film deposition system using ultrasonic nebulization was adopted in this study. SnCl4.5H2O, SbCl3, and TaCl5 were used as solutes. Ethanol was used as the solvent. Solutions of different Sn4+ concentration, Sb concentration (Sb/Sn atomic ratio) in Sn, and Ta concentration (Ta/Sn atomic ratio) in Sn were mixed. The mist was generated from a solution by the agitation of an ultrasonic device operating at about 1.65MHz. The mist was carried to the heated substrate (corning 7059 glass) by the flow of nitrogen gas so that it was decomposed by heat. SnO2-x films were deposited on the substrate due to the pyrolysis reaction.
The experiment included six series: Sn4+ concentration series, Sb-doping series, temperature series, Ta-doping series, aging time series and nebulization rate series. SnO2-x films were analyzed by XRD, UV-Visible, SEM, and Hall-measurement. The optimum deposition conditions were obtained through analyses of these six series.
The film deposition rate of nonaged solution was faster than aged solution. When the nebulization rate of solution was 1.6 ml/min, the resistivity of undoped SnO2 film obtained with the substrate kept at 450 oC is 2.364×10-2Ω-cm and the maximum transmittance of the visible light is 78.7%. When Sb/Sn atomic ratio in the solution was 2%, the resistivity of Sb doped SnO2 film obtained with the substrate kept at 525 oC is 2.77×10-3Ω-cm and the maximum transmittance of the visible light is 71% . When Ta/Sn atomic ratio in the solution was 0.1%, the resistivity of Ta doped SnO2 film obtained with the substrate kept at 450 oC is 3.917×10-2Ω-cm and the maximum transmittance of the visible light is 85%
In this study, the electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic nebulization process were reported and discussed carefully through film characterizations.
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author2 |
Bing-Hwait Hwang |
author_facet |
Bing-Hwait Hwang Shang-Chien Li 李尚謙 |
author |
Shang-Chien Li 李尚謙 |
spellingShingle |
Shang-Chien Li 李尚謙 Electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic atomization process |
author_sort |
Shang-Chien Li |
title |
Electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic atomization process |
title_short |
Electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic atomization process |
title_full |
Electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic atomization process |
title_fullStr |
Electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic atomization process |
title_full_unstemmed |
Electro-optical properties of Sb and Ta doped SnO2 thin films derived from an ultrasonic atomization process |
title_sort |
electro-optical properties of sb and ta doped sno2 thin films derived from an ultrasonic atomization process |
publishDate |
2002 |
url |
http://ndltd.ncl.edu.tw/handle/99919811646719652559 |
work_keys_str_mv |
AT shangchienli electroopticalpropertiesofsbandtadopedsno2thinfilmsderivedfromanultrasonicatomizationprocess AT lǐshàngqiān electroopticalpropertiesofsbandtadopedsno2thinfilmsderivedfromanultrasonicatomizationprocess AT shangchienli yǐchāoyīnbōwùhuàfǎzhìbèizhītíjítǎncànzáyǎnghuàxībáomózhīguāngdiàntèxìng AT lǐshàngqiān yǐchāoyīnbōwùhuàfǎzhìbèizhītíjítǎncànzáyǎnghuàxībáomózhīguāngdiàntèxìng |
_version_ |
1716865740733153280 |