Low Temperature and Normal Pressure Plasma Equipment Developed for destroying Perfluorocompounds

碩士 === 國立屏東科技大學 === 環境工程與科學系 === 90 === The purpose of this study was to develop a low temperature and normal pressure plasma equipment for destroys CF4 of Perfluorocompounds. The plasma equipment had been successfully established, fabricated and tested. In the process of testing, some pa...

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Bibliographic Details
Main Authors: Tung-Ming Tsai, 蔡東明
Other Authors: Kuo-Ching Chang
Format: Others
Language:zh-TW
Published: 2002
Online Access:http://ndltd.ncl.edu.tw/handle/50845198938527119910
Description
Summary:碩士 === 國立屏東科技大學 === 環境工程與科學系 === 90 === The purpose of this study was to develop a low temperature and normal pressure plasma equipment for destroys CF4 of Perfluorocompounds. The plasma equipment had been successfully established, fabricated and tested. In the process of testing, some parameters were changed to find suitable ignition conditions, including gas flow rate, type of gas and distance between electrodes. Now, the chamber was successfully firing. From some successful firing experience, it would be helpful to stabilize and hold the plasma by increasing gas flow and shortening distance between electrodes. The future work is to produce high-energy plasma on equipment for destroying CF4 or other gases of air pollution.